The Integrated Optics Laboratory currently has facilities for designing, fabricating, and testing guided wave integrated optic devices. This includes thin film deposition (metals and dielectrics), photolithography, and diffusion furnaces. The lab contains equipment for patterned poling of ferroelectric wafers up to 3". We are also able to do extensive optical characterization at selected wavelengths in the visible and in the near-IR, including fiber-device-fiber loss and extinction ratio measurements. Processing and characterization equipment include:

• Guided wave integrated optic characterization test bed
• Dual ion beam sputtering system for metal and dielectric thin film deposition
• Diffusion furnaces
• CW Ti:sapphire, pulsed Nd:YAG with frequency doubling and an OPO
• A variety of diode lasers and LEDS.
• Fixed and tunable, visible and near IR, laser sources
• Fiber optic amplifiers to 10W
• Programmable high voltage poling station for patterned poling of wafers to 3"
• Computer controlled spectrometers and optical spectrum analyzer for both fluorescence excitation and standard absorption spectroscopy
• Fluorescence excitation and standard absorption spectroscopy
• Microwave test bench with a 50 GHz network analyzer

Several high-speed computing systems are available for image analysis and model calculations. We have state-of-the-art computational fluid dynamic and related transport phenomena modeling as well as optical modeling of composite structures.